Park Systems, the leading nanotechnology solutions partner of nanoscale measurements, would like to invite you to visit us at SemiconJapan 2010 (Booth# 5A-203), December7th-9th, 2011 at the Makuhari Messe in Chiba, Japan. Park Systems, in its continuing efforts to provide our customers with nanometrologysolutions for today’s challenges in device manufacturing, will be featuring a range ofautomated AFM products for in-line fab. Theexhibition will provide an excellent opportunity to learn about the XE-Wafer, our automated industrial AFM for in-line wafer inspection and metrology of 200 mm and 300 mm wafers, and the XE-3DM, our new 3D AFM for high resolution 3D metrology with patented tilted Z-scan system. The XE-3DM is a breakthrough in high resolution imaging of deep undercut structures and sidewalls. In addition, our True Non-Contact Mode enables non-destructive measurement of soft photoresist surface with high aspect ratio tips. Come and discover Park Systems’ fully automated AFM solutions for process monitoring and characterization of critical topographies!
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